Publication:
The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layers
Date
| dc.contributor.author | Lee, Hean-Cheal | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.date.accessioned | 2021-09-30T12:33:03Z | |
| dc.date.available | 2021-09-30T12:33:03Z | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2715 | |
| dc.source.beginpage | 147 | |
| dc.source.endpage | 150 | |
| dc.source.issue | 1 | |
| dc.source.journal | Thin Solid Films | |
| dc.source.volume | 320 | |
| dc.title | The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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