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Electrochemical and analytical study of the Si etching mechanism in HF

Date

2009
Meeting abstract
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dc.contributor.authorValckx, Nick
dc.contributor.authorVos, Rita
dc.contributor.authorRip, Jens
dc.contributor.authorDoumen, Geert
dc.contributor.authorMertens, Paul
dc.contributor.authorBearda, Twan
dc.contributor.authorHeyns, Marc
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-18T03:51:14Z
dc.date.available2021-10-18T03:51:14Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16341
dc.source.beginpage2102
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.title

Electrochemical and analytical study of the Si etching mechanism in HF

dc.typeMeeting abstract
dspace.entity.typePublication
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