Publication:
Etch challenges brought by the metal hardmask approach for advanced contact patterning with fluorocarbon-based plasma
Date
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Goossens, Danny | |
| dc.contributor.author | Shamiryan, Denis | |
| dc.contributor.author | Lazzarino, Frederic | |
| dc.contributor.author | Struyf, Herbert | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.contributor.imecauthor | Goossens, Danny | |
| dc.contributor.imecauthor | Lazzarino, Frederic | |
| dc.contributor.imecauthor | Struyf, Herbert | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.date.accessioned | 2021-10-17T06:44:45Z | |
| dc.date.available | 2021-10-17T06:44:45Z | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13605 | |
| dc.identifier.url | http://absimage.aps.org/image/MWS_GEC08-2008-000177.pdf | |
| dc.source.conference | 60th Annual Gaseous Electronics Conference | |
| dc.source.conferencedate | 13/10/2008 | |
| dc.source.conferencelocation | Dallas, TX US | |
| dc.title | Etch challenges brought by the metal hardmask approach for advanced contact patterning with fluorocarbon-based plasma | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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