Publication:
Integration of dual work function CMOS using doped high-K dielectric and metal gates to achieve improved power-performance
Date
Loading...
Files
Journal
Abstract
Description
Statistics
Views
1864 since deposited on 2021-10-17
Acq. date: 2026-04-26
Citations
Statistics
Views
1864 since deposited on 2021-10-17
Acq. date: 2026-04-26
Citations