Publication:

Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions

Date

2023
Journal article
https://doi.org/10.1116/6.0002347
Simple item page Full metadata Statistics
 
dc.contributor.authorVan Dongen, Kaat
dc.contributor.authorNye, Rachel
dc.contributor.authorClerix, Jan-Willem
dc.contributor.authorSixt, Claudia
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorVan Dongen, Kaat
dc.contributor.imecauthorNye, Rachel
dc.contributor.imecauthorClerix, Jan-Willem
dc.contributor.imecauthorSixt, Claudia
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.contributor.orcidimecClerix, Jan-Willem::0000-0002-2681-4569
dc.date.accessioned2023-06-30T14:45:28Z
dc.date.available2023-04-06T04:02:05Z
dc.date.available2023-06-30T14:45:28Z
dc.date.embargo2023-09-23
dc.date.issued2023
dc.description.wosFundingTextThe authors acknowledge Inpria Corporation for providing the metal-oxide resist and Peter De Schepper and Sonia Castellanos Ortega from Inpria Corporation for valuable discussions. The authors acknowledge Ilse Hoflijk, Anja Vanleenhove and Thierry Conard from imec for their discussions involving XPS characterization and data analysis. We thank Jorne Domen from KU Leuven for assistance in sample characterization. Jan-Willem Clerix acknowledges funding from The Research Foundation-Flanders (FWO) for a Ph.D. fellowship strategic basic research (Project No. 1SB4321N).
dc.identifier.doi10.1116/6.0002347
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41429
dc.publisherA V S AMER INST PHYSICS
dc.source.beginpageArt.: 032404
dc.source.endpagena
dc.source.issue3
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
dc.source.numberofpages14
dc.source.volume41
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.subject.keywordsMETAL-OXIDES
dc.subject.keywordsGROWTH
dc.subject.keywordsSIO2
dc.subject.keywordsHEXAMETHYLDISILAZANE
dc.subject.keywordsELECTRONEGATIVITY
dc.subject.keywordsPASSIVATION
dc.subject.keywordsNUCLEATION
dc.subject.keywordsRUTHENIUM
dc.subject.keywordsMECHANISM
dc.title

Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
JVA22-AR-ASD2022-00550_accepted_version.pdf
Size:
10.96 MB
Format:
Adobe Portable Document Format
Description:
Accepted version
Download
Publication available in collections:
Articles