Publication:

Economical shallow emitter formation by plasma immersion ion implantation and RTA process

Date

1998
Proceedings Paper
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dc.contributor.authorPinter, Istvan
dc.contributor.authorDusco, C.
dc.contributor.authorKhanh, N. Q.
dc.contributor.authorAdam, M.
dc.contributor.authorMakaro, Z.
dc.contributor.authorBarsony, I.
dc.contributor.authorSivoththaman, Sivanarayanamoorthy
dc.contributor.authorPoortmans, Jef
dc.contributor.authorAdriaenssens, G.
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-01T08:41:40Z
dc.date.available2021-10-01T08:41:40Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2868
dc.source.beginpage1475
dc.source.conference2nd World Conference and Exhibition on Photovoltaic Solar Energy Conversion
dc.source.conferencedate6/07/1998
dc.source.conferencelocationVienna Austria
dc.source.endpage1478
dc.title

Economical shallow emitter formation by plasma immersion ion implantation and RTA process

dc.typeProceedings paper
dspace.entity.typePublication
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