Publication:

Analysis of the Gate Current's Influence on the RF Power Performance of InAlN/GaN HEMTs

 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-5206-1062
cris.virtual.orcid0000-0003-0769-7069
cris.virtual.orcid0000-0003-0576-4344
cris.virtual.orcid0000-0002-5204-932X
cris.virtual.orcid0000-0001-9166-4408
cris.virtual.orcid0000-0002-1540-2462
cris.virtual.orcid0000-0003-3463-416X
cris.virtual.orcid0000-0002-8490-2436
cris.virtual.orcid0000-0002-8062-3165
cris.virtual.orcid0000-0003-2892-3176
cris.virtual.orcid0000-0003-4388-7257
cris.virtual.orcid0000-0002-7581-870X
cris.virtualsource.department9235f2f7-eb91-4015-80ca-a43f0631165f
cris.virtualsource.department78f3a04c-1a79-488d-b3c6-436cafb31dd0
cris.virtualsource.departmentfe3b6e68-9f34-476c-b847-c72527808ecf
cris.virtualsource.departmentd19d60c5-01a5-494e-8733-f650f84bd566
cris.virtualsource.department37e9b359-0d14-4379-bfa0-e5593f0acf46
cris.virtualsource.department7a5a4305-52bd-4138-a04d-4f840231d874
cris.virtualsource.departmentfa867be9-6d43-441a-8209-5ffdc9d82a84
cris.virtualsource.department1cdccd4f-82c4-4615-ac4c-61f45cb012be
cris.virtualsource.departmentc807a03a-358d-4274-b622-dee889a60454
cris.virtualsource.department948aac93-47b8-4f21-8d0e-48fd52ec8746
cris.virtualsource.department04854297-248a-40b9-b457-b79f899da9f8
cris.virtualsource.department5d12abec-29ff-4812-ab67-e957a23676cb
cris.virtualsource.orcid9235f2f7-eb91-4015-80ca-a43f0631165f
cris.virtualsource.orcid78f3a04c-1a79-488d-b3c6-436cafb31dd0
cris.virtualsource.orcidfe3b6e68-9f34-476c-b847-c72527808ecf
cris.virtualsource.orcidd19d60c5-01a5-494e-8733-f650f84bd566
cris.virtualsource.orcid37e9b359-0d14-4379-bfa0-e5593f0acf46
cris.virtualsource.orcid7a5a4305-52bd-4138-a04d-4f840231d874
cris.virtualsource.orcidfa867be9-6d43-441a-8209-5ffdc9d82a84
cris.virtualsource.orcid1cdccd4f-82c4-4615-ac4c-61f45cb012be
cris.virtualsource.orcidc807a03a-358d-4274-b622-dee889a60454
cris.virtualsource.orcid948aac93-47b8-4f21-8d0e-48fd52ec8746
cris.virtualsource.orcid04854297-248a-40b9-b457-b79f899da9f8
cris.virtualsource.orcid5d12abec-29ff-4812-ab67-e957a23676cb
dc.contributor.authorXiao, Dongping
dc.contributor.authorSchreurs, Dominique M. M. -P.
dc.contributor.authorElKashlan, Rana Y.
dc.contributor.authorZhang, Yang
dc.contributor.authorCooman, Adam
dc.contributor.authorKhaled, Ahmad
dc.contributor.authorSmellie, Daanish
dc.contributor.authorAlian, AliReza
dc.contributor.authorAsad, Muhammad
dc.contributor.authorParvais, Bertrand
dc.contributor.authorWambacq, Piet
dc.contributor.authorPeralagu, Uthayasankaran
dc.contributor.authorCollaert, Nadine
dc.contributor.imecauthorXiao, Dongping
dc.contributor.imecauthorElKashlan, Rana
dc.contributor.imecauthorZhang, Yang
dc.contributor.imecauthorCooman, Adam
dc.contributor.imecauthorKhaled, Ahmad
dc.contributor.imecauthorSmellie, Daanish
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorAsad, Muhammad
dc.contributor.imecauthorParvais, Bertrand
dc.contributor.imecauthorWambacq, Piet
dc.contributor.imecauthorPeralagu, Uthayasankaran
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecXiao, Dongping::0000-0002-7581-870X
dc.contributor.orcidimecElKashlan, Rana::0000-0003-0576-4344
dc.contributor.orcidimecZhang, Yang::0000-0002-1540-2462
dc.contributor.orcidimecCooman, Adam::0000-0002-5206-1062
dc.contributor.orcidimecKhaled, Ahmad::0000-0003-2892-3176
dc.contributor.orcidimecSmellie, Daanish::0000-0002-8490-2436
dc.contributor.orcidimecAlian, AliReza::0000-0003-3463-416X
dc.contributor.orcidimecAsad, Muhammad::0000-0002-5204-932X
dc.contributor.orcidimecParvais, Bertrand::0000-0003-0769-7069
dc.contributor.orcidimecWambacq, Piet::0000-0003-4388-7257
dc.contributor.orcidimecPeralagu, Uthayasankaran::0000-0001-9166-4408
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2025-05-05T11:47:37Z
dc.date.available2024-08-15T18:46:44Z
dc.date.available2025-05-05T11:47:37Z
dc.date.issued2025
dc.description.wosFundingTextThis work was supported by imec Advanced RF imec Industrial Affiliation Program (IIAP).
dc.identifier.doi10.1109/TMTT.2024.3431196
dc.identifier.issn0018-9480
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44305
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
dc.source.beginpage779
dc.source.endpage788
dc.source.issue2
dc.source.journalIEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES
dc.source.numberofpages10
dc.source.volume73
dc.subject.keywordsALGAN/GAN
dc.subject.keywordsRELIABILITY
dc.title

Analysis of the Gate Current's Influence on the RF Power Performance of InAlN/GaN HEMTs

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections: