Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell

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Author(s)

Ercken, Monique

;

Altamirano Sanchez, Efrain

;

Baerts, Christina

;

;

De Backer, Johan

;

Delvaux, Christie

;

;

Horiguchi, Naoto

;

Locorotondo, Sabrina

;

Vandeweyer, Tom

;

Veloso, Anabela

;

Verhaegen, Staf

Journal

Microelectronic Engineering

Metrics

1947 since deposited on 2021-10-18

2last month

Acq. date: 2025-12-08