Publication:

Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell

Date

2010
Journal article
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dc.contributor.authorErcken, Monique
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorBaerts, Christina
dc.contributor.authorBrus, Stephan
dc.contributor.authorDe Backer, Johan
dc.contributor.authorDelvaux, Christie
dc.contributor.authorDemand, Marc
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorVeloso, Anabela
dc.contributor.authorVerhaegen, Staf
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorDe Backer, Johan
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-18T16:15:22Z
dc.date.available2021-10-18T16:15:22Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17078
dc.source.beginpage993
dc.source.endpage996
dc.source.issue5_8
dc.source.journalMicroelectronic Engineering
dc.source.volume87
dc.title

Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell

dc.typeJournal article
dspace.entity.typePublication
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