Publication:

Channel hot-carrier degradation in pMOS and nMOS short channel transistors with high-k dielectric stack

Date

2010
Journal article
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dc.contributor.authorAmat, Esteve
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorDegraeve, Robin
dc.contributor.authorRodríguez, Rosana
dc.contributor.authorNafría, Montse
dc.contributor.authorAymerich, Xavier
dc.contributor.authorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGroeseneken, Guido
dc.date.accessioned2021-10-18T15:15:33Z
dc.date.available2021-10-18T15:15:33Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16649
dc.source.beginpage47
dc.source.endpage50
dc.source.issue1
dc.source.journalMicroelectronic Engineering
dc.source.volume87
dc.title

Channel hot-carrier degradation in pMOS and nMOS short channel transistors with high-k dielectric stack

dc.typeJournal article
dspace.entity.typePublication
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