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Full quantummechanical treatment of charge leakage in MOS capacitors with ultra-thin oxide layers

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dc.contributor.authorMagnus, Wim
dc.contributor.authorSchoenmaker, Wim
dc.contributor.imecauthorMagnus, Wim
dc.date.accessioned2021-10-14T11:29:57Z
dc.date.available2021-10-14T11:29:57Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3647
dc.source.beginpage248
dc.source.conferenceESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium.
dc.source.conferencelocation
dc.source.endpage251
dc.title

Full quantummechanical treatment of charge leakage in MOS capacitors with ultra-thin oxide layers

dc.typeProceedings paper
dspace.entity.typePublication
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