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Materials and electrical characterization of metal gate electrodes on high-k dielectrics for advanced CMOS technologies

Date

2002
Proceedings Paper
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dc.contributor.authorHooker, Jacob
dc.contributor.authorLander, Rob
dc.contributor.authorRittersma, Chris
dc.contributor.authorSchram, Tom
dc.contributor.authorLujan, Guilherme
dc.contributor.authorvan Zijl, Jeroen
dc.contributor.authorvan den Heuvel, Eric
dc.contributor.authorRoozeboom, Fred
dc.contributor.imecauthorSchram, Tom
dc.date.accessioned2021-10-14T21:49:36Z
dc.date.available2021-10-14T21:49:36Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6404
dc.source.beginpage174
dc.source.conferenceExtended Abstracts of the 2002 International Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate17/09/2002
dc.source.conferencelocationNagoya Japan
dc.source.endpage175
dc.title

Materials and electrical characterization of metal gate electrodes on high-k dielectrics for advanced CMOS technologies

dc.typeProceedings paper
dspace.entity.typePublication
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