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Residue control in the removal of La2O3/HfO2 for high-k/metal gate formation: balancing plasma etch, strip and wet clean
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1953 since deposited on 2021-10-18
2last month
Acq. date: 2025-12-15
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Metrics
Views
1953 since deposited on 2021-10-18
2last month
Acq. date: 2025-12-15
Citations