Publication:
Residue control in the removal of La2O3/HfO2 for high-k/metal gate formation: balancing plasma etch, strip and wet clean
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1961 since deposited on 2021-10-18
5last month
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Acq. date: 2026-08-10
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Statistics
Views
1961 since deposited on 2021-10-18
5last month
1last week
Acq. date: 2026-08-10
Citations