Publication:
Residue control in the removal of La2O3/HfO2 for high-k/metal gate formation: balancing plasma etch, strip and wet clean
Date
| dc.contributor.author | Hellin, David | |
| dc.contributor.author | Vos, Ingrid | |
| dc.contributor.author | Geypen, Jef | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Paraschiv, Vasile | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.author | Vertommen, Johan | |
| dc.contributor.imecauthor | Hellin, David | |
| dc.contributor.imecauthor | Vos, Ingrid | |
| dc.contributor.imecauthor | Geypen, Jef | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.imecauthor | Paraschiv, Vasile | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.date.accessioned | 2021-10-18T16:58:34Z | |
| dc.date.available | 2021-10-18T16:58:34Z | |
| dc.date.issued | 2010 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17242 | |
| dc.source.conference | 3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM | |
| dc.source.conferencedate | 4/03/2010 | |
| dc.source.conferencelocation | Grenoble France | |
| dc.title | Residue control in the removal of La2O3/HfO2 for high-k/metal gate formation: balancing plasma etch, strip and wet clean | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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