Publication:

Endurance/retention trade-off on HfO2 / metal cap 1T1R bipolar RRAM

Date

2013
Journal article
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dc.contributor.authorChen, Yangyin
dc.contributor.authorGoux, Ludovic
dc.contributor.authorClima, Sergiu
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorFantini, Andrea
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorWouters, Dirk
dc.contributor.authorJurczak, Gosia
dc.contributor.imecauthorChen, Yangyin
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.date.accessioned2021-10-21T06:56:13Z
dc.date.available2021-10-21T06:56:13Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22129
dc.source.beginpage1114
dc.source.endpage1121
dc.source.issue3
dc.source.journalIEEE Transactions on Electron Devices
dc.source.volume60
dc.title

Endurance/retention trade-off on HfO2 / metal cap 1T1R bipolar RRAM

dc.typeJournal article
dspace.entity.typePublication
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