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Influence of Si precursor on Ge segregation during ultrathin Si reduced pressure chemical vapor deposition on Ge
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Influence of Si precursor on Ge segregation during ultrathin Si reduced pressure chemical vapor deposition on Ge
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Date
2009-12
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vincent, Benjamin
;
Vandervorst, Wilfried
;
Caymax, Matty
;
Loo, Roger
Journal
Applied Physics Letters
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1781
since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations
Metrics
Views
1781
since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations