Publication:
Alleviation of Negative-Bias Temperature Instability in Si p-FinFETs With ALD W Gate-Filling Metal by Annealing Process Optimization
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605 since deposited on 2021-11-02
36last month
9last week
Acq. date: 2026-05-18
Views
1665 since deposited on 2021-11-02
1last month
Acq. date: 2026-05-18
Citations