Publication:
Alleviation of Negative-Bias Temperature Instability in Si p-FinFETs With ALD W Gate-Filling Metal by Annealing Process Optimization
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Acq. date: 2026-04-26
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585 since deposited on 2021-11-02
47last month
15last week
Acq. date: 2026-04-26
Views
1664 since deposited on 2021-11-02
3last month
Acq. date: 2026-04-26
Citations