Publication:
Degradation and breakdown of 0.9 nm EOT SiO2/ ALD HfO2/metal gate stacks under positive constant voltage stress
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1940 since deposited on 2021-10-16
1last month
Acq. date: 2026-06-07
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Statistics
Views
1940 since deposited on 2021-10-16
1last month
Acq. date: 2026-06-07
Citations