Publication:
Voltage contrast determination of design rules at the limits of EUV single patterning
| dc.contributor.author | Blanco, Victor | |
| dc.contributor.author | De Poortere, Etienne P. | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Cerbu, Dorin | |
| dc.contributor.author | van de Kerkhove, Jeroen | |
| dc.contributor.author | Kissoon, Nicola N. | |
| dc.contributor.imecauthor | Leray, Philippe | |
| dc.contributor.imecauthor | Cerbu, Dorin | |
| dc.contributor.imecauthor | van de Kerkhove, Jeroen | |
| dc.contributor.imecauthor | Blanco, Victor | |
| dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
| dc.contributor.orcidimec | Van de Kerkhove, Jeroen::0009-0005-4824-0411 | |
| dc.contributor.orcidimec | Blanco, Victor::0000-0003-4308-0381 | |
| dc.date.accessioned | 2024-03-25T12:47:35Z | |
| dc.date.available | 2024-02-27T17:42:52Z | |
| dc.date.available | 2024-03-25T12:47:35Z | |
| dc.date.issued | 2023 | |
| dc.identifier.doi | 10.1117/1.JMM.22.4.041604 | |
| dc.identifier.issn | 1932-5150 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43595 | |
| dc.publisher | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | |
| dc.source.beginpage | Art. 041604 | |
| dc.source.endpage | N/A | |
| dc.source.issue | 4 | |
| dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
| dc.source.numberofpages | 7 | |
| dc.source.volume | 22 | |
| dc.title | Voltage contrast determination of design rules at the limits of EUV single patterning | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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