Publication:

Towards optimally shaped fins in P-channel tri-gate FETs: Can fin height be reduced further?

Date

2005
Proceedings Paper
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dc.contributor.authorDixit, Abhisek
dc.contributor.authorKottantharayil, Anil
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorCollaert, Nadine
dc.contributor.authorBrus, Stephan
dc.contributor.authorRichard, Olivier
dc.contributor.authorRooyackers, Rita
dc.contributor.authorGoodwin, Michael
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDe Meyer, Kristin
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-16T01:23:53Z
dc.date.available2021-10-16T01:23:53Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10396
dc.source.beginpage112
dc.source.conferenceProceedings IEEE VLSI-TSA International Symposium on VLSI Technology
dc.source.conferencedate25/04/2005
dc.source.conferencelocationHsinchu Taiwan
dc.source.endpage113
dc.title

Towards optimally shaped fins in P-channel tri-gate FETs: Can fin height be reduced further?

dc.typeProceedings paper
dspace.entity.typePublication
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