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Presentations
Etch challenges on single and dual SOI fins patterning for CFET at 25nm fin pitch
Publication:
Etch challenges on single and dual SOI fins patterning for CFET at 25nm fin pitch
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Date
2019
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chan, BT
;
Boemmels, Juergen
;
Ryckaert, Julien
;
Zhang, Liping
;
Tao, Zheng
;
Altamirano Sanchez, Efrain
;
de Marneffe, Jean-Francois
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2037
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Acq. date: 2025-12-15
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Metrics
Views
2037
since deposited on 2021-10-27
2
last month
2
last week
Acq. date: 2025-12-15
Citations