Publication:
Reliability of copper low-k interconnects
Date
| dc.contributor.author | Tokei, Zsolt | |
| dc.contributor.author | Croes, Kristof | |
| dc.contributor.author | Beyer, Gerald | |
| dc.contributor.imecauthor | Tokei, Zsolt | |
| dc.contributor.imecauthor | Croes, Kristof | |
| dc.contributor.imecauthor | Beyer, Gerald | |
| dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
| dc.date.accessioned | 2021-10-18T22:22:14Z | |
| dc.date.available | 2021-10-18T22:22:14Z | |
| dc.date.issued | 2010 | |
| dc.identifier.issn | 0167-9317 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18090 | |
| dc.source.beginpage | 348 | |
| dc.source.endpage | 354 | |
| dc.source.issue | 3 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 87 | |
| dc.title | Reliability of copper low-k interconnects | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |