Publication:

Design-driven optimisation of a 90 nm RF CMOS process by use of elevated source/drain

Date

2003-09
Proceedings Paper
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dc.contributor.authorLinten, Dimitri
dc.contributor.authorThijs, Steven
dc.contributor.authorJeamsaksiri, Wutthinan
dc.contributor.authorMahadeva Iyer, Natarajan
dc.contributor.authorDe Heyn, Vincent
dc.contributor.authorVassilev, Vesselin
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorScholten, A.J.
dc.contributor.authorBadenes, G.
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorDonnay, Stephane
dc.contributor.authorWambacq, Piet
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.imecauthorThijs, Steven
dc.contributor.imecauthorDe Heyn, Vincent
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorDonnay, Stephane
dc.contributor.imecauthorWambacq, Piet
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.contributor.orcidimecThijs, Steven::0000-0003-2889-8345
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecDonnay, Stephane::0000-0003-2489-4793
dc.contributor.orcidimecWambacq, Piet::0000-0003-4388-7257
dc.date.accessioned2021-10-15T05:25:08Z
dc.date.available2021-10-15T05:25:08Z
dc.date.issued2003-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7810
dc.source.beginpage43
dc.source.conference33rd European Solid-State Devices Research Conference - ESSDERC
dc.source.conferencedate16/09/2003
dc.source.conferencelocationEstoril Portugal
dc.source.endpage46
dc.title

Design-driven optimisation of a 90 nm RF CMOS process by use of elevated source/drain

dc.typeProceedings paper
dspace.entity.typePublication
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