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Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow

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dc.contributor.authorGronheid, Roel
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorParnell, Doni
dc.contributor.authorChan, BT
dc.contributor.authorLee, Yu-tsung
dc.contributor.authorVan Look, Lieve
dc.contributor.authorCao, Yi
dc.contributor.authorHer, YoungJun
dc.contributor.authorLin, Guanyang
dc.contributor.authorHarukawa, Ryoto
dc.contributor.authorNagaswami, Venkat
dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorSomervell, Mark
dc.contributor.authorNealey, Paul
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorHer, YoungJun
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-22T01:46:00Z
dc.date.available2021-10-22T01:46:00Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23886
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1852186
dc.source.beginpage904905
dc.source.conferenceAlternative Lithographic Technologies VI
dc.source.conferencedate24/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.title

Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow

dc.typeProceedings paper
dspace.entity.typePublication
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