Publication:

Physical analysis of beakdown in High-k /metal gate stacks using TEM/EELS and STM for relibaility enhancement

Date

2011
Journal article
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Author(s)

Pey, Kin Leong
;
Raghavan, Nagarajan
;
Wu, Xing
;
Liu, Wenhu
;
Li, Xiang
;
Bosman, Michel
;
Shubhakar, Kalya
;
Lwin, Zin Zar
;
Chen, Yining
;
Qin, Hailang
;
Kauerauf, Thomas

Journal

Microelectronic Engineering

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1959 since deposited on 2021-10-19
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Acq. date: 2026-06-05

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