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Physical analysis of beakdown in High-k /metal gate stacks using TEM/EELS and STM for relibaility enhancement
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Physical analysis of beakdown in High-k /metal gate stacks using TEM/EELS and STM for relibaility enhancement
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Date
2011
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22647.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pey, Kin Leong
;
Raghavan, Nagarajan
;
Wu, Xing
;
Liu, Wenhu
;
Li, Xiang
;
Bosman, Michel
;
Shubhakar, Kalya
;
Lwin, Zin Zar
;
Chen, Yining
;
Qin, Hailang
;
Kauerauf, Thomas
Journal
Microelectronic Engineering
Abstract
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1951
since deposited on 2021-10-19
Acq. date: 2025-12-10
Citations
Metrics
Views
1951
since deposited on 2021-10-19
Acq. date: 2025-12-10
Citations