Publication:
DSA patterning scaling through lithography and etch process integration
Date
| dc.contributor.author | Rathsack, Ben | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.date.accessioned | 2021-10-20T15:09:16Z | |
| dc.date.available | 2021-10-20T15:09:16Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21383 | |
| dc.source.conference | Semicon West 2012 | |
| dc.source.conferencedate | 9/07/2012 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.title | DSA patterning scaling through lithography and etch process integration | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |