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DSA patterning scaling through lithography and etch process integration

Date

 
dc.contributor.authorRathsack, Ben
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-20T15:09:16Z
dc.date.available2021-10-20T15:09:16Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21383
dc.source.conferenceSemicon West 2012
dc.source.conferencedate9/07/2012
dc.source.conferencelocationSan Francisco, CA USA
dc.title

DSA patterning scaling through lithography and etch process integration

dc.typeOral presentation
dspace.entity.typePublication
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