Publication:

Improvement of the CMOS characteristics of bulk Si FinFETs by high temperature ion implantation

Date

2016
Meeting abstract
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Author(s)

Kikuchi, Yoshiaki  
;
Hopf, Toby  
;
Mannaert, Geert  
;
Tao, Zheng  
;
Waite, A.
;
Cournoyer, J.
;
Borniquel, J.
;
Schreutelkamp, Rob
;
Ritzenthaler, Romain  
;
Kim, Min-Soo  
;
Kubicek, Stefan  
;
Chew, Soon Aik
;
Devriendt, Katia  
;
Schram, Tom  
;
Demuynck, Steven  
;
Variam, N.
;
Horiguchi, Naoto  
;
Mocuta, Dan

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1913 since deposited on 2021-10-23
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