Publication:

HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity

Date

2005
Proceedings Paper
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dc.contributor.authorParaschiv, Vasile
dc.contributor.authorClaes, Martine
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-16T03:54:35Z
dc.date.available2021-10-16T03:54:35Z
dc.date.embargo9999-12-31
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10983
dc.source.beginpage97
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
dc.source.endpage102
dc.title

HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity

dc.typeProceedings paper
dspace.entity.typePublication
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