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Comparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment

Date

1996
Proceedings Paper
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dc.contributor.authorWolke, K.
dc.contributor.authorSchenkl, M.
dc.contributor.authorSilvestre, P.
dc.contributor.authorBellandi, E.
dc.contributor.authorAlessandri, M.
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorMeuris, Marc
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-29T15:54:18Z
dc.date.available2021-09-29T15:54:18Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1663
dc.source.beginpage199
dc.source.conferenceProceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate23/09/1996
dc.source.conferencelocationAntwerpen Belgium
dc.source.endpage203
dc.title

Comparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment

dc.typeProceedings paper
dspace.entity.typePublication
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