Publication:

Spacer defined FinFET: Active area patterning of sub-20 nm fins with high density

Date

2007
Journal article
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dc.contributor.authorDegroote, Bart
dc.contributor.authorRooyackers, Rita
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorCollaert, Nadine
dc.contributor.authorBoullart, Werner
dc.contributor.authorKunnen, Eddy
dc.contributor.authorShamiryan, Denis
dc.contributor.authorWouters, J.
dc.contributor.authorVan Puymbroeck, Jan
dc.contributor.authorDixit, Abhisek
dc.contributor.authorJurczak, Gosia
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVan Puymbroeck, Jan
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-16T15:42:14Z
dc.date.available2021-10-16T15:42:14Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12024
dc.source.beginpage609
dc.source.endpage618
dc.source.issue4
dc.source.journalMicroelectronic Engineering
dc.source.volume84
dc.title

Spacer defined FinFET: Active area patterning of sub-20 nm fins with high density

dc.typeJournal article
dspace.entity.typePublication
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