Publication:

Study of novel EUVL mask absorber candidates

Date

2021
Journal article
https://doi.org/10.1117/1.JMM.20.2.021002
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Author(s)

Wu, Meiyi  
;
Thakare, Devesh  
;
De Marneffe, Jean-Francois
;
Jaenen, Patrick  
;
Souriau, Laurent  
;
Opsomer, Karl  
;
Soulie, Jean-Philippe
;
Erdmann, Andreas
;
Mesilhy, Hazem
;
Naujok, Philipp
;
Foltin, Markus
;
Soltwisch, Victor
;
Saadeh, Qais
;
Philipsen, Vicky  

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

Abstract

Description

Metrics

Views

1969 since deposited on 2022-02-21
Acq. date: 2025-10-26

Citations

Metrics

Views

1969 since deposited on 2022-02-21
Acq. date: 2025-10-26

Citations