Study of novel EUVL mask absorber candidates

Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky

doi:10.1117/1.JMM.20.2.021002

Publication:

Study of novel EUVL mask absorber candidates

Date

2021

Journal article

https://doi.org/10.1117/1.JMM.20.2.021002

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Author(s)

Wu, Meiyi

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Thakare, Devesh

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De Marneffe, Jean-Francois

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Jaenen, Patrick

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Souriau, Laurent

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Opsomer, Karl

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Soulie, Jean-Philippe

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Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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1972 since deposited on 2022-02-21

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Acq. date: 2025-12-10

Study of novel EUVL mask absorber candidates

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