Publication:

Study of novel EUVL mask absorber candidates

Date

2021

Journal article

https://doi.org/10.1117/1.JMM.20.2.021002

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Author(s)

;

Thakare, Devesh

;

de Marneffe, Jean-Francois

;

Jaenen, Patrick

;

Souriau, Laurent

;

;

Soulie, Jean-Philippe

;

Erdmann, Andreas

;

;

Naujok, Philipp

;

;

Soltwisch, Victor

;

;

Philipsen, Vicky

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

Statistics

1978 since deposited on 2022-02-21

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Acq. date: 2026-03-16