Publication:
Plasma-damage mitigation of a 2.0 PECVD porous organo silicon glass by pore stuffing
Date
| dc.contributor.author | Heyne, Markus | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Zhang, Liping | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.contributor.imecauthor | Zhang, Liping | |
| dc.date.accessioned | 2021-10-21T08:15:54Z | |
| dc.date.available | 2021-10-21T08:15:54Z | |
| dc.date.issued | 2013 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22486 | |
| dc.source.conference | Plasma Etch and Strip in Microtechnology - PESM | |
| dc.source.conferencedate | 14/03/2013 | |
| dc.source.conferencelocation | Leuven Belgium | |
| dc.title | Plasma-damage mitigation of a 2.0 PECVD porous organo silicon glass by pore stuffing | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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