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Electron diffraction contrast imaging as a tool for nano-range strain analysis and application to a semiconductor laser structure

Date

1995
Proceedings Paper
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dc.contributor.authorJanssens, Koenraad
dc.contributor.authorVanhellemont, Jan
dc.contributor.authorMaes, Herman
dc.contributor.authorVan Der Biest, O.
dc.contributor.authorHull, R.
dc.date.accessioned2021-09-29T13:07:59Z
dc.date.available2021-09-29T13:07:59Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/694
dc.source.beginpage579
dc.source.conferenceMicroscopy of Semiconducting Materials 1995. Proceedings
dc.source.conferencedate20/03/1995
dc.source.conferencelocationOxford UK
dc.source.endpage582
dc.title

Electron diffraction contrast imaging as a tool for nano-range strain analysis and application to a semiconductor laser structure

dc.typeProceedings paper
dspace.entity.typePublication
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