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The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials

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dc.contributor.authorBraginsky, O.V.
dc.contributor.authorKovalev, A.S.
dc.contributor.authorLopaev, D.V.
dc.contributor.authorMalykhin, E.M.
dc.contributor.authorMankelevich, Y.A.
dc.contributor.authorRakhimova, T.V.
dc.contributor.authorRakhimov, A.T.
dc.contributor.authorVasilieva, A.N.
dc.contributor.authorZyryanov, S.M.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T21:27:28Z
dc.date.available2021-10-17T21:27:28Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15035
dc.source.conference62nd Annual Gaseous Electronics Conference - GEC
dc.source.conferencedate20/10/2009
dc.source.conferencelocationSaratoga Springs, NY USA
dc.title

The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials

dc.typeProceedings paper
dspace.entity.typePublication
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