Publication:
Interfacial chemistry at high-k oxide layers on pretreated silicon wafers: XPS and TOF-SIMS study
Date
| dc.contributor.author | Vitchev, R. | |
| dc.contributor.author | Conard, Thierry | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Houssiau, L. | |
| dc.contributor.author | Pireaux, J.J. | |
| dc.contributor.imecauthor | Conard, Thierry | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
| dc.date.accessioned | 2021-10-15T17:42:55Z | |
| dc.date.available | 2021-10-15T17:42:55Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9881 | |
| dc.source.conference | 31st Conference on the Physics and Chemistry of Semiconductor Interfaces | |
| dc.source.conferencedate | 18/01/2004 | |
| dc.source.conferencelocation | Kailua-Kona, HI USA | |
| dc.title | Interfacial chemistry at high-k oxide layers on pretreated silicon wafers: XPS and TOF-SIMS study | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
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