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Replacement metal gate/high-k last technology for aggressively scaled planar and FinFET-based devices
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Replacement metal gate/high-k last technology for aggressively scaled planar and FinFET-based devices
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Date
2014
Proceedings Paper
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29317.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Veloso, Anabela
;
Lee, Jae Woo
;
Simoen, Eddy
;
Ragnarsson, Lars-Ake
;
Arimura, Hiroaki
;
Cho, Moon Ju
;
Boccardi, Guillaume
;
Thean, Aaron
;
Horiguchi, Naoto
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Acq. date: 2026-01-05
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1834
since deposited on 2021-10-22
Acq. date: 2026-01-05
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Downloads
1
since deposited on 2021-10-22
Acq. date: 2026-01-05
Views
1834
since deposited on 2021-10-22
Acq. date: 2026-01-05
Citations