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Replacement metal gate/high-k last technology for aggressively scaled planar and FinFET-based devices

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1 since deposited on 2021-10-22
Acq. date: 2026-01-05

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1834 since deposited on 2021-10-22
Acq. date: 2026-01-05

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1 since deposited on 2021-10-22
Acq. date: 2026-01-05

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1834 since deposited on 2021-10-22
Acq. date: 2026-01-05

Citations