Publication:

Impact of thinning and through silicon via proximity on high-k / metal gate first CMOS performance

Date

2010
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorStucchi, Michele
dc.contributor.authorMinas, Nikolaos
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorThangaraju, Sarasvathi
dc.contributor.authorVelenis, Dimitrios
dc.contributor.authorDomae, Shinichi
dc.contributor.authorYang, Yu
dc.contributor.authorKatti, Guruprasad
dc.contributor.authorLabie, Riet
dc.contributor.authorOkoro, Chukwudi
dc.contributor.authorZhao, Ming
dc.contributor.authorAsimakopoulos, Panagiotis
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorChiarella, Thomas
dc.contributor.authorSchram, Tom
dc.contributor.authorRohr, Erika
dc.contributor.authorVan Ammel, Annemie
dc.contributor.authorJourdain, Anne
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorVelenis, Dimitrios
dc.contributor.imecauthorLabie, Riet
dc.contributor.imecauthorZhao, Ming
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorVan Ammel, Annemie
dc.contributor.imecauthorJourdain, Anne
dc.contributor.imecauthorRuythooren, Wouter
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecLabie, Riet::0000-0002-1401-1291
dc.contributor.orcidimecZhao, Ming::0000-0002-0856-851X
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecSoussan, Philippe::0000-0002-1347-6978
dc.contributor.orcidimecVan der Plas, Geert::0000-0002-4975-6672
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.accessioned2021-10-18T19:04:18Z
dc.date.available2021-10-18T19:04:18Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17620
dc.source.beginpage109
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate15/06/2010
dc.source.conferencelocationHonolulu, HI US
dc.source.endpage110
dc.title

Impact of thinning and through silicon via proximity on high-k / metal gate first CMOS performance

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
20209.pdf
Size:
2.51 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions