Publication:

Unbiased roughness measurements for 0.55NA EUV material setup

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2658505
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dc.contributor.authorMathew, Bobin
dc.contributor.authorArad, Shahar
dc.contributor.authorBrand, Omri
dc.contributor.authorFrank, Tal
dc.contributor.authorAlkoken, Ran
dc.contributor.authorShilo, Yael
dc.contributor.authorMelamed, Yarden
dc.contributor.authorYosef, Rotem Mor
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorHeo, Seonggil
dc.contributor.authorHalder, Sandip
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorHeo, Seonggil
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecHeo, Seonggil::0009-0007-1447-7183
dc.date.accessioned2023-10-13T07:38:26Z
dc.date.available2023-07-28T17:39:56Z
dc.date.available2023-10-13T07:38:26Z
dc.date.embargo2023-03-02
dc.date.issued2023
dc.identifier.doi10.1117/12.2658505
dc.identifier.eisbn978-1-5106-6100-4
dc.identifier.isbn978-1-5106-6099-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42234
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 1249607
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVII
dc.source.conferencedateFEB 27-MAR 02, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume12496
dc.title

Unbiased roughness measurements for 0.55NA EUV material setup

dc.typeProceedings paper
dspace.entity.typePublication
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