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Litho and patterning challenges for memory and logic applications at the 22nm node

Date

2010
Proceedings Paper
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dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorNikolsky, Peter
dc.contributor.authorVan Dommelen, Youri
dc.contributor.authorWatso, Robert
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorVan Look, Lieve
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-18T16:21:42Z
dc.date.available2021-10-18T16:21:42Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17104
dc.source.beginpage76400C
dc.source.conferenceOptical Microlithography XXIII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
dc.title

Litho and patterning challenges for memory and logic applications at the 22nm node

dc.typeProceedings paper
dspace.entity.typePublication
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