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Conference contributions
Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm
Publication:
Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm
Date
1996
Proceedings Paper
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1210.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Vertommen, Johan
;
Van Roey, Frieda
;
Yen, Anthony
;
Tritchkov, Alexander
;
Ronse, Kurt
;
Jonckheere, Rik
;
Van den hove, Luc
Journal
Abstract
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1923
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Views
1923
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations