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Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm

Date

1996
Proceedings Paper
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dc.contributor.authorGoethals, Mieke
dc.contributor.authorVertommen, Johan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorYen, Anthony
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorRonse, Kurt
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-09-29T14:30:47Z
dc.date.available2021-09-29T14:30:47Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1235
dc.source.beginpage362
dc.source.conferenceOptical Microlithography IX
dc.source.conferencedate10/03/1996
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage374
dc.title

Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm

dc.typeProceedings paper
dspace.entity.typePublication
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