Area selective grafting of siloxane molecules on low-k dielectric with resepct to copper surface

dc.contributor.author	Rezvanov, Askar
dc.contributor.author	Gornev, E.S.
dc.contributor.author	de Marneffe, Jean-Francois
dc.contributor.author	Armini, Silvia
dc.contributor.imecauthor	de Marneffe, Jean-Francois
dc.contributor.imecauthor	Armini, Silvia
dc.contributor.orcidimec	Armini, Silvia::0000-0003-0578-3422
dc.date.accessioned	2021-10-27T17:03:45Z
dc.date.available	2021-10-27T17:03:45Z
dc.date.issued	2019
dc.identifier.issn	0169-4332
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/33889
dc.identifier.url	https://www.sciencedirect.com/science/article/pii/S0169433219300972
dc.source.beginpage	317
dc.source.endpage	324
dc.source.journal	Applied Surface Science
dc.source.volume	476
dc.title	Area selective grafting of siloxane molecules on low-k dielectric with resepct to copper surface
dc.type	Journal article
dspace.entity.type	Publication
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