Patterning developments in spin-on hard mask systems for 30nm half pitch EUV technology

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Author(s)

Truffert, Vincent

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Pollentier, Ivan

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Foubert, Philippe

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Lazzarino, Frederic

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;

Ercken, Monique

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Demuynck, Steven

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Metrics

1883 since deposited on 2021-10-20

Acq. date: 2025-10-23