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Patterning developments in spin-on hard mask systems for 30nm half pitch EUV technology
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Patterning developments in spin-on hard mask systems for 30nm half pitch EUV technology
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Date
2012
Proceedings Paper
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23668.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Truffert, Vincent
;
Pollentier, Ivan
;
Foubert, Philippe
;
Lazzarino, Frederic
;
Wilson, Chris
;
Ercken, Monique
;
Gronheid, Roel
;
Demuynck, Steven
;
Buch, Xavier
;
Anno, Yusuke
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1886
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Acq. date: 2025-12-10
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Views
1886
since deposited on 2021-10-20
3
last month
Acq. date: 2025-12-10
Citations