Publication:

Patterning developments in spin-on hard mask systems for 30nm half pitch EUV technology

Date

2012
Proceedings Paper
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dc.contributor.authorTruffert, Vincent
dc.contributor.authorPollentier, Ivan
dc.contributor.authorFoubert, Philippe
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorWilson, Chris
dc.contributor.authorErcken, Monique
dc.contributor.authorGronheid, Roel
dc.contributor.authorDemuynck, Steven
dc.contributor.authorBuch, Xavier
dc.contributor.authorAnno, Yusuke
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2021-10-20T17:11:10Z
dc.date.available2021-10-20T17:11:10Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21639
dc.source.beginpage832511
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXIX
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan José, CA USA
dc.title

Patterning developments in spin-on hard mask systems for 30nm half pitch EUV technology

dc.typeProceedings paper
dspace.entity.typePublication
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