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Influence of metal electrode stoichiometry on the electron barrier height at CuxTe1-x/Al2O3 interfaces for CBRAM
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Influence of metal electrode stoichiometry on the electron barrier height at CuxTe1-x/Al2O3 interfaces for CBRAM
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Date
2014
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Stefano, Francesca
;
Afanasiev, Valeri
;
Houssa, Michel
;
Goux, Ludovic
;
Opsomer, Karl
;
Jurczak, Gosia
;
Stesmans, Andre
Journal
Microelectronic Engineering
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1839
since deposited on 2021-10-22
Acq. date: 2025-12-15
Citations
Metrics
Views
1839
since deposited on 2021-10-22
Acq. date: 2025-12-15
Citations