Publication:

Impact of substrate rotation and temperature on the mobility and series resistance of triple-gate SOI nMOSFETs

Date

2011
Proceedings Paper
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dc.contributor.authorde Souza, M.
dc.contributor.authorPavanello, M.A.
dc.contributor.authorMartino, J.A.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-19T13:07:31Z
dc.date.available2021-10-19T13:07:31Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18799
dc.source.beginpage223
dc.source.conference26th Symposium on Microelectronics Technology and Devices - SBMicro
dc.source.conferencedate30/08/2011
dc.source.conferencelocationJoao Pessoa Brazil
dc.source.endpage230
dc.title

Impact of substrate rotation and temperature on the mobility and series resistance of triple-gate SOI nMOSFETs

dc.typeProceedings paper
dspace.entity.typePublication
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