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Improving the growth of HfO2 ALD layers by modifying growth parameters and reducing precursors contaminants
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Improving the growth of HfO2 ALD layers by modifying growth parameters and reducing precursors contaminants
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Conard, Thierry
;
Delabie, Annelies
;
Vandervorst, Wilfried
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1786
since deposited on 2021-10-16
Acq. date: 2025-12-15
Citations
Metrics
Views
1786
since deposited on 2021-10-16
Acq. date: 2025-12-15
Citations