Publication:

Improving the growth of HfO2 ALD layers by modifying growth parameters and reducing precursors contaminants

Date

2005
Proceedings Paper
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Author(s)

Conard, Thierry  
;
Delabie, Annelies  
;
Vandervorst, Wilfried  

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Abstract

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1791 since deposited on 2021-10-16
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