Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Low-voltage 6T FinFET SRAM cell with high SNM using HfSiON/TiN gate stack, fin widths down to 10nm and 30nm gate length
Publication:
Low-voltage 6T FinFET SRAM cell with high SNM using HfSiON/TiN gate stack, fin widths down to 10nm and 30nm gate length
Date
2008
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
16044.pdf
384.24 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Collaert, Nadine
;
von Arnim, Klaus
;
Rooyackers, Rita
;
Vandeweyer, Tom
;
Mercha, Abdelkarim
;
Parvais, Bertrand
;
Witters, Liesbeth
;
Nackaerts, Axel
;
Altamirano Sanchez, Efrain
;
Demand, Marc
;
Hikavyy, Andriy
;
Demuynck, Steven
;
Devriendt, Katia
;
Bauer, F.
;
Ferain, Isabelle
;
Veloso, Anabela
;
De Meyer, Kristin
;
Biesemans, Serge
;
Jurczak, Gosia
Journal
Abstract
Description
Metrics
Views
1944
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1944
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations