Publication:
Correlation of actinic blank inspection and experimental phase defect printability study on NXE3x00 EUV scanner
Date
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Takagi, Noriaki | |
| dc.contributor.author | Watanabe, Hidehiro | |
| dc.contributor.author | Gallagher, Emily | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
| dc.contributor.imecauthor | Gallagher, Emily | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.contributor.orcidimec | Gallagher, Emily::0000-0002-2927-8298 | |
| dc.date.accessioned | 2021-10-22T19:57:33Z | |
| dc.date.available | 2021-10-22T19:57:33Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2015 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25438 | |
| dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2207817 | |
| dc.source.beginpage | 942216 | |
| dc.source.conference | Extreme Ultraviolet (EUV) Lithography VI | |
| dc.source.conferencedate | 22/02/2015 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Correlation of actinic blank inspection and experimental phase defect printability study on NXE3x00 EUV scanner | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |