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Investigations and physical modelling of saturation effects in lateral DMOS transistor architectures based on the concept of intrinsic drain voltage

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dc.contributor.authorAnghel, C.
dc.contributor.authorHefyene, N.
dc.contributor.authorIonescu, A. M.
dc.contributor.authorVermandel, Miguel
dc.contributor.authorBakeroot, Benoit
dc.contributor.authorDoutrloigne, J.
dc.contributor.authorGillon, R.
dc.contributor.authorFrere, S.
dc.contributor.authorMaier., C.
dc.contributor.authorMourier, Y.
dc.contributor.imecauthorBakeroot, Benoit
dc.contributor.orcidimecBakeroot, Benoit::0000-0003-4392-1777
dc.date.accessioned2021-10-14T16:36:10Z
dc.date.available2021-10-14T16:36:10Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5012
dc.source.beginpage399
dc.source.conferenceProceedings of the 31st European Solid-State Device Research Conference
dc.source.conferencedate11/09/2001
dc.source.conferencelocationNuremberg Germany
dc.source.endpage402
dc.title

Investigations and physical modelling of saturation effects in lateral DMOS transistor architectures based on the concept of intrinsic drain voltage

dc.typeProceedings paper
dspace.entity.typePublication
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